We are committed to sharing our facilities and associated expertise with external academic and industrial collaborators. To discuss your requirements, please contact the staff listed on the pages below.
|Electron beam lithography||Our JEOL JBX-6300FS is a state-of-the-art vector scan electron beam lithography system capable of patterning lines less than 10nm wide.|
|Molecular beam epitaxy facility||Our in-house Oxford Instruments V80H III–V MBE machine gives us the ability to grow layered compound semiconductor structures|
|Nanotechnology cleanroom||Comprises of a suite of laboratories including 200 m2 ISO 5 (Class 100) cleanroom supported by > 100 m2 of ancillary laboratory space for testing, packaging and post-processing, alongside a 30 m2 ISO4 (Class 10) cleanroom dedicated to our Jeol JBX-6300FS electron-beam lithography (EBL) system.|
|School of Electronic and Electrical Engineering||An <a href="http://eps.leeds.ac.uk/electronic-engineering-research-innovation/doc/research-facilities-4">overview of the facilities</a> available within the School of Electronic and Electrical Engineering.|