We are committed to sharing our facilities and associated expertise with external academic and industrial collaborators. To discuss your requirements, please contact the staff listed on the pages below.

Facility title Overview
Electron beam lithography Our JEOL JBX-6300FS is a state-of-the-art vector scan electron beam lithography system capable of patterning lines less than 10nm wide.
Molecular beam epitaxy facility Our in-house Oxford Instruments V80H III–V MBE machine gives us the ability to grow layered compound semiconductor structures
Nanotechnology cleanroom Comprises of a suite of laboratories including 200 m2 ISO 5 (Class 100) cleanroom supported by > 100 m2 of ancillary laboratory space for testing, packaging and post-processing, alongside a 30 m2 ISO4 (Class 10) cleanroom dedicated to our Jeol JBX-6300FS electron-beam lithography (EBL) system.
School of Electronic and Electrical Engineering An <a href="http://eps.leeds.ac.uk/electronic-engineering-research-innovation/doc/research-facilities-4">overview of the facilities</a> available within the School of Electronic and Electrical Engineering.